Jaju, Vishwas (2004) SOI Technology. Iowa State University, Ames, Iowa.
Full text available as:
Abstract - This article explains the issues related to silicon-on-insulator technology. As the bulk silicon CMOS processes are reaching there limit in terms of device miniaturization and fabrication, SOI technology gives a good alternative to that. SOI technology is considered to take the CMOS processing to its ultimate scalability, and a brief review of work published by many research groups is presented in this paper. Firstly, technological development on fabrication of silicon–on-insulator wafers is presented. After that focusing upon CMOS technology, different types of SOI MOSFETs and related physical concepts are evaluated. Finally double gate MOSFET’s properties, and its pros and cons over bulk CMOS technology are explained.
Archive Staff Only: edit this record